For the second year in a row, Lerner David participated in the Rutgers Douglas Residential College Externship Program. We welcomed Ana C. Lopez, a returning extern with a biological sciences major, and Grace Liu with a pharmacy major. Also participated (but not in the Externship Program) is Lerner David employee Nikita Eddy, a Rutgers alumna, working part-time while studying for the patent bar to become a patent agent.
The week-long program consisted of virtual interactive sessions on patent procurement, studies/opinions, trademarks and patent litigation given by various partners of the firm. The students had mentoring sessions with junior attorneys and the managing partner. Students also participated in a virtual meeting with female attorneys to foster and strengthen relationships with women in the legal profession.
About Rutgers Douglass Residential College Externship Program
This externship program is an immersive workplace experience for a one or two week time period where students are mentored by a professional in their area of interest or in a career that they would like to learn more about. Participating in this job shadowing experience allows students to work on projects, learn about the status of women in the workplace, and get an inside glimpse into the day-to-day work life in a particular career. Visit https://douglass.rutgers.edu/career-development/reilly-program-bold-center-advancing-womens-professional-development for more information.
About Lerner David
Lerner David specializes solely in intellectual property law. For over 50 years, Lerner David has thrived as an IP law firm, focusing on IP litigation, post grant proceedings, patent and trademark procurement, global IP asset management, licensing, due diligence and freedom-to-operate studies, privacy law and other IP rights. Lerner David is serving a diverse client base around the world, from start-ups to Fortune 500 companies, providing valuable global IP strategies. The firm has offices in New Jersey, Japan and China. Visit www.lernerdavid.com for more information.